Microelectronics processing :  chemical engineering aspects / 
Dennis W. Hess, editor, Klavs F. Jensen, editor. 
 - Washington, D.C. :  American Chemical Society,  c1989. 
 - xiv, 547 p. :  ill. ;  24 cm. 
 - Advances in chemistry series ;  221 .
<br/><br/>Includes bibliographical references and indexes. 
<br/><br/>Microelectronics processing / Dennis W. Hess and Klavs F. Jensen -- Theory of transport processes in semiconductor crystal growth from the melt / Robert A. Brown -- Liquid-phase epitaxy and phase diagrams of compound semiconductors / Timothy J. Anderson -- Physical vapor deposition reactors / T. W. Fraser Russell, Bill N. Baron, Scott C. Jackson and Richard E. Rocheleau -- Chemical vapor deposition / Klavs F. Jensen -- Diffusion and oxidation of silicon / Richard B. Fair -- Resists in microlithography / Michael J. O'Brien and David S. Soane -- Plasma-enhanced etching and deposition / Dennis W. Hess and David B. Graves -- Interconnection and packaging of high-performance integrated circuits / Ronald J. Jensen -- Semiconductor processing problems solved by wet (solution) chemistry / Marjorie K. Balazs. 
<br/><br/><label>ISBN: </label>0841214751 
<br/><br/><label>LCCN: </label>89006862 
<br/><br/><label>Subjects--Topical Terms: </label><br/>Microelectronics--Materials.<br/>Integrated circuits--Design and construction.<br/>Surface chemistry.
<br/><br/><label>Dewey Class. No.: </label>621.381