MTU Cork Library Catalogue

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Microelectronics processing : chemical engineering aspects / Dennis W. Hess, editor, Klavs F. Jensen, editor.

Contributor(s): Hess, Dennis W | Jensen, Klavs F, 1952-.
Material type: materialTypeLabelBookSeries: Advances in chemistry series ; 221.Publisher: Washington, D.C. : American Chemical Society, c1989Description: xiv, 547 p. : ill. ; 24 cm.ISBN: 0841214751.Subject(s): Microelectronics -- Materials | Integrated circuits -- Design and construction | Surface chemistryDDC classification: 621.381
Contents:
Microelectronics processing / Dennis W. Hess and Klavs F. Jensen -- Theory of transport processes in semiconductor crystal growth from the melt / Robert A. Brown -- Liquid-phase epitaxy and phase diagrams of compound semiconductors / Timothy J. Anderson -- Physical vapor deposition reactors / T. W. Fraser Russell, Bill N. Baron, Scott C. Jackson and Richard E. Rocheleau -- Chemical vapor deposition / Klavs F. Jensen -- Diffusion and oxidation of silicon / Richard B. Fair -- Resists in microlithography / Michael J. O'Brien and David S. Soane -- Plasma-enhanced etching and deposition / Dennis W. Hess and David B. Graves -- Interconnection and packaging of high-performance integrated circuits / Ronald J. Jensen -- Semiconductor processing problems solved by wet (solution) chemistry / Marjorie K. Balazs.
Holdings
Item type Current library Call number Copy number Status Date due Barcode Item holds
General Lending MTU Bishopstown Library Lending 621.381 (Browse shelf(Opens below)) 1 Available 00027326
Total holds: 0

Enhanced descriptions from Syndetics:

Although chemical engineering principles are at the heart of solid state process technology, until now no reference volume addressing this relationship was available. This is the first book of its kind to tie fundamental engineering concepts to solid state process technology. Discussing the basic concepts involved--liquid-phase epitaxy, physical and chemical vapor deposition, diffusion and oxidation in silicon, resists in microlithography, etc.--this volume will be particularly useful in chemical engineering courses. It offers a framework within which specialized courses in microelectronics processing can be organized. In addition, it serves as a valuable reference source for all industrial engineers working with the individual process steps covered.

Includes bibliographical references and indexes.

Microelectronics processing / Dennis W. Hess and Klavs F. Jensen -- Theory of transport processes in semiconductor crystal growth from the melt / Robert A. Brown -- Liquid-phase epitaxy and phase diagrams of compound semiconductors / Timothy J. Anderson -- Physical vapor deposition reactors / T. W. Fraser Russell, Bill N. Baron, Scott C. Jackson and Richard E. Rocheleau -- Chemical vapor deposition / Klavs F. Jensen -- Diffusion and oxidation of silicon / Richard B. Fair -- Resists in microlithography / Michael J. O'Brien and David S. Soane -- Plasma-enhanced etching and deposition / Dennis W. Hess and David B. Graves -- Interconnection and packaging of high-performance integrated circuits / Ronald J. Jensen -- Semiconductor processing problems solved by wet (solution) chemistry / Marjorie K. Balazs.

Table of contents provided by Syndetics

  • Microelectronics Processing
  • Theory of Transport Processes in Semiconductor Crystal Growth from the Melt
  • Liquid-Phase Epitaxy and Phase Diagrams of Compound Semiconductors
  • Physical Vapor Deposition Reactors
  • Chemical Vapor Deposition
  • Diffusion and Oxidation of Silicon
  • Resists in Microlithography
  • Plasma-Enhanced Etching and Deposition
  • Interconnection and Packaging of High-Performance Integrated Circuits
  • Semiconductor Processing Problems Solved by Wet (Solution) Chemistry

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